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9:00-9:40 |
T. Abe (ShinEtsu Handotai) |
Point Defects in Silicon Melt Growth from the Experimental Results |
|
9:40-10:10 |
A. Ikari (Siltronic Japan ) |
450 mm Wafer Generation - Challenges for the Silicon Producer |
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10:10-10:40 |
T. Taishi (Shinshu Univ.) |
Czochralski Germanium Crystal Growth with Low Dislocation Density and
Oxygen Impurities |